Detailed Information

Cited 36 time in webofscience Cited 34 time in scopus
Metadata Downloads

Electrosynthesis of copper phosphide thin films for efficient water oxidation

Full metadata record
DC Field Value Language
dc.contributor.authorPawar, Sambhaji M.-
dc.contributor.authorPawar, Bharati S.-
dc.contributor.authorBabar, Pravin T.-
dc.contributor.authorAhmed, Abu Talha Aqueel-
dc.contributor.authorChavan, Harish S.-
dc.contributor.authorJo, Yongcheol-
dc.contributor.authorCho, Sangeun-
dc.contributor.authorKim, Jongmin-
dc.contributor.authorInamdar, Akbar I.-
dc.contributor.authorKim, Jin Hyeok-
dc.contributor.authorKim, Hyungsang-
dc.contributor.authorIm, Hyunsik-
dc.date.accessioned2024-09-26T10:00:41Z-
dc.date.available2024-09-26T10:00:41Z-
dc.date.issued2019-04-15-
dc.identifier.issn0167-577X-
dc.identifier.issn1873-4979-
dc.identifier.urihttps://scholarworks.dongguk.edu/handle/sw.dongguk/24347-
dc.description.abstractA copper phosphide (Cu3P) thin film is synthesized on a Ni foam using a one-step electrodeposition method at room temperature and annealed at 300 degrees C in Ar atmosphere. The Cu3P film is amorphous and has a flat morphology with surface voids. It works as an electrocatalyst for water oxidation in an alkaline 1 M KOH electrolyte. It exhibits excellent catalytic oxygen evolution reaction with an overpotential of 310 mV, Tafel slope of 88 mV/dec, and good stability over 20 h of operation at 10 mA/cm(2). The excellent OER performance is due to its large electrochemically active surface area and low charge transfer resistance at the catalyst-electrolyte interface after the annealing. (C) 2019 Elsevier B.V. All rights reserved.-
dc.format.extent5-
dc.language영어-
dc.language.isoENG-
dc.publisherELSEVIER SCIENCE BV-
dc.titleElectrosynthesis of copper phosphide thin films for efficient water oxidation-
dc.typeArticle-
dc.publisher.location네델란드-
dc.identifier.doi10.1016/j.matlet.2019.01.118-
dc.identifier.scopusid2-s2.0-85061135340-
dc.identifier.wosid000458792600061-
dc.identifier.bibliographicCitationMATERIALS LETTERS, v.241, pp 243 - 247-
dc.citation.titleMATERIALS LETTERS-
dc.citation.volume241-
dc.citation.startPage243-
dc.citation.endPage247-
dc.type.docTypeArticle-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClasssci-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusHYDROGEN EVOLUTION-
dc.subject.keywordPlusOXYGEN-
dc.subject.keywordPlusELECTROCATALYST-
dc.subject.keywordPlusNANOSHEETS-
dc.subject.keywordPlusELECTRODE-
dc.subject.keywordPlusARRAYS-
dc.subject.keywordAuthorCopper phosphide-
dc.subject.keywordAuthorElectrodeposition-
dc.subject.keywordAuthorOxygen evolution reaction-
dc.subject.keywordAuthorAnnealing effect-
Files in This Item
There are no files associated with this item.
Appears in
Collections
College of Natural Science > Department of Physics > 1. Journal Articles
College of Advanced Convergence Engineering > Division of System Semiconductor > 1. Journal Articles

qrcode

Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.

Related Researcher

Researcher Inamdar, Akbar Ibrahim photo

Inamdar, Akbar Ibrahim
College of Advanced Convergence Engineering (Division of System Semiconductor)
Read more

Altmetrics

Total Views & Downloads

BROWSE