Cited 15 time in
Resistance switching mode transformation in SrRuO3/Cr-doped SrZrO3/Pt frameworks via a thermally activated Ti out-diffusion process
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Jo, Yongcheol | - |
| dc.contributor.author | Jung, Kyooho | - |
| dc.contributor.author | Kim, Jongmin | - |
| dc.contributor.author | Woo, Hyeonseok | - |
| dc.contributor.author | Han, Jaeseok | - |
| dc.contributor.author | Kim, Hyungsang | - |
| dc.contributor.author | Hong, Jinpyo | - |
| dc.contributor.author | Lee, Jeon-Kook | - |
| dc.contributor.author | Im, Hyunsik | - |
| dc.date.accessioned | 2024-09-26T09:03:12Z | - |
| dc.date.available | 2024-09-26T09:03:12Z | - |
| dc.date.issued | 2014-12-08 | - |
| dc.identifier.issn | 2045-2322 | - |
| dc.identifier.uri | https://scholarworks.dongguk.edu/handle/sw.dongguk/23942 | - |
| dc.description.abstract | This work reports on a mechanism for irreversible resistive switching (RS) transformation from bipolar to unipolar RS behavior in SrRuO3 (SRO)/Cr-doped SrZrO3 (SZO:Cr)/Pt capacitor structures prepared on a Ti/SiO2/Si substrate. Counter-clockwise bipolar RS memory current-voltage (I-V) characteristics are observed within the RS voltage window of -2.5 to +1.9 V, with good endurance and retention properties. As the bias voltage increases further beyond 4 V under a forward bias, a forming process occurs resulting in irreversible RS mode transformation from bipolar to unipolar mode. This switching mode transformation is a direct consequence of thermally activated Ti out-diffusion from a Ti adhesion layer. Transition metal Ti effectively out-diffuses through the loose Pt electrode layer at high substrate temperatures, leading to the unintended formation of a thin titanium oxide (TiOx where x < 2) layer between the Pt electrode and the SZO:Cr layer as well as additional Ti atoms in the SZO:Cr layer. Cross-sectional scanning electron microscopy, transmission electron microscopy and Auger electron spectroscopy depth-profile measurements provided apparent evidence of the Ti out-diffusion phenomenon. We propose that the out-diffusion-induced additional Ti atoms in the SZO:Cr layer contributes to the creation of the metallic filamentary channels. | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | NATURE PUBLISHING GROUP | - |
| dc.title | Resistance switching mode transformation in SrRuO3/Cr-doped SrZrO3/Pt frameworks via a thermally activated Ti out-diffusion process | - |
| dc.type | Article | - |
| dc.publisher.location | 영국 | - |
| dc.identifier.doi | 10.1038/srep07354 | - |
| dc.identifier.scopusid | 2-s2.0-84923233657 | - |
| dc.identifier.wosid | 000346273700002 | - |
| dc.identifier.bibliographicCitation | SCIENTIFIC REPORTS, v.4 | - |
| dc.citation.title | SCIENTIFIC REPORTS | - |
| dc.citation.volume | 4 | - |
| dc.type.docType | Article | - |
| dc.description.isOpenAccess | Y | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
| dc.relation.journalWebOfScienceCategory | Multidisciplinary Sciences | - |
| dc.subject.keywordPlus | THIN-FILMS | - |
| dc.subject.keywordPlus | OXIDE-FILMS | - |
| dc.subject.keywordPlus | MEMORY | - |
| dc.subject.keywordPlus | ELECTRODES | - |
| dc.subject.keywordPlus | EVOLUTION | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
30, Pildong-ro 1-gil, Jung-gu, Seoul, 04620, Republic of Korea+82-2-2260-3114
Copyright(c) 2023 DONGGUK UNIVERSITY. ALL RIGHTS RESERVED.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.
