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Role of immersion time on the properties of SILAR deposited CuO thin films

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dc.contributor.authorRavichandran, A. T.-
dc.contributor.authorDhanabalan, K.-
dc.contributor.authorValanarasu, S.-
dc.contributor.authorVasuhi, A.-
dc.contributor.authorKathalingam, A.-
dc.date.accessioned2024-09-26T09:03:05Z-
dc.date.available2024-09-26T09:03:05Z-
dc.date.issued2015-02-
dc.identifier.issn0957-4522-
dc.identifier.issn1573-482X-
dc.identifier.urihttps://scholarworks.dongguk.edu/handle/sw.dongguk/23903-
dc.description.abstractCuO thin films were synthesized at relatively low temperature by employing an inexpensive SILAR method. Effect of immersion time on the properties of grown film was studied using structural, morphological and optical characterizations. Structural, morphological, optical and electrical studies of the prepared CuO films were done using X-ray diffraction, field emission scanning electron microscope, and UV-Vis-NIR spectrometer and Hall probe, respectively. The films were found show different nanostructures depending on immersion time. The calculated crystalline size of the films is found increase with the increase of immersion time, and it is found to be 19 nm for 30 s immersion time. Vibration peaks of Cu-O and O-Cu-O bonds have been identified using Fourier transformation infrared spectroscopy. Optical band gap energy of the grown CuO films is calculated and it is found vary from 1.8 to 1.6 eV depending on the immersion time and annealing temperature. Hall effect measurements have shown a p-type conductivity of the grown films.-
dc.format.extent6-
dc.language영어-
dc.language.isoENG-
dc.publisherSPRINGER-
dc.titleRole of immersion time on the properties of SILAR deposited CuO thin films-
dc.typeArticle-
dc.publisher.location네델란드-
dc.identifier.doi10.1007/s10854-014-2483-0-
dc.identifier.scopusid2-s2.0-84925502758-
dc.identifier.wosid000349439500041-
dc.identifier.bibliographicCitationJOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, v.26, no.2, pp 921 - 926-
dc.citation.titleJOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS-
dc.citation.volume26-
dc.citation.number2-
dc.citation.startPage921-
dc.citation.endPage926-
dc.type.docTypeArticle-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClasssci-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.subject.keywordPlusOXIDE-FILMS-
dc.subject.keywordPlusSTRUCTURAL-PROPERTIES-
dc.subject.keywordPlusFIBERGLASS-
dc.subject.keywordPlusOXIDATION-
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