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Cited 10 time in webofscience Cited 13 time in scopus
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Review on Se-and S-doped hydrogenated amorphous silicon thin films

Authors
Sharma, Sanjeev K.Im, HyunsikKim, Deuk YoungMehra, R. M.
Issue Date
May-2014
Publisher
NATL INST SCIENCE COMMUNICATION-NISCAIR
Keywords
Hydrogenated amorphous silicon; Double donor; Optical-properties; Electrical properties; Conduction mechanism
Citation
INDIAN JOURNAL OF PURE & APPLIED PHYSICS, v.52, no.5, pp 293 - 313
Pages
21
Indexed
SCIE
SCOPUS
Journal Title
INDIAN JOURNAL OF PURE & APPLIED PHYSICS
Volume
52
Number
5
Start Page
293
End Page
313
URI
https://scholarworks.dongguk.edu/handle/sw.dongguk/23586
ISSN
0019-5596
0975-1041
Abstract
Hydrogenated amorphous silicon thin films manufactured by plasma deposition techniques are widely used in electronic and optoelectronic devices. The optical and electrical properties of undoped and doped hydrogenated amorphous silicon (a-Si:H) thin films determine the importance and characteristics of the final film structure of practical devices. In particular, a-Si:H thin film solar cells and optical sensors have many industrial and technical advantages, such as being light weight, low cost, and having a large deposition area. The a-Si:H thin film is one of the candidates for flexible solar cells for use in space. This article reviews the optical and electrical properties of double donor Se-and S-doped a-Si:H thin films, which can be considered as an alternative to wide bandgap absorbing layers in the next generation of optoelectronic devices.
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