Review on Se-and S-doped hydrogenated amorphous silicon thin films
- Authors
- Sharma, Sanjeev K.; Im, Hyunsik; Kim, Deuk Young; Mehra, R. M.
- Issue Date
- May-2014
- Publisher
- NATL INST SCIENCE COMMUNICATION-NISCAIR
- Keywords
- Hydrogenated amorphous silicon; Double donor; Optical-properties; Electrical properties; Conduction mechanism
- Citation
- INDIAN JOURNAL OF PURE & APPLIED PHYSICS, v.52, no.5, pp 293 - 313
- Pages
- 21
- Indexed
- SCIE
SCOPUS
- Journal Title
- INDIAN JOURNAL OF PURE & APPLIED PHYSICS
- Volume
- 52
- Number
- 5
- Start Page
- 293
- End Page
- 313
- URI
- https://scholarworks.dongguk.edu/handle/sw.dongguk/23586
- ISSN
- 0019-5596
0975-1041
- Abstract
- Hydrogenated amorphous silicon thin films manufactured by plasma deposition techniques are widely used in electronic and optoelectronic devices. The optical and electrical properties of undoped and doped hydrogenated amorphous silicon (a-Si:H) thin films determine the importance and characteristics of the final film structure of practical devices. In particular, a-Si:H thin film solar cells and optical sensors have many industrial and technical advantages, such as being light weight, low cost, and having a large deposition area. The a-Si:H thin film is one of the candidates for flexible solar cells for use in space. This article reviews the optical and electrical properties of double donor Se-and S-doped a-Si:H thin films, which can be considered as an alternative to wide bandgap absorbing layers in the next generation of optoelectronic devices.
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Collections - College of Natural Science > Division of Physics & Semiconductor Science > 1. Journal Articles

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