Cited 4 time in
Polymeric surfactants with high acid values for emulsion type pressure-sensitive adhesives
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Qin, Pei | - |
| dc.contributor.author | Lee, Myung Cheon | - |
| dc.date.accessioned | 2024-08-08T12:01:56Z | - |
| dc.date.available | 2024-08-08T12:01:56Z | - |
| dc.date.issued | 2024-07 | - |
| dc.identifier.issn | 0167-7322 | - |
| dc.identifier.issn | 1873-3166 | - |
| dc.identifier.uri | https://scholarworks.dongguk.edu/handle/sw.dongguk/22019 | - |
| dc.description.abstract | Low molecular weight polymers with hydrophobic-carboxyl groups have been usually used as anionic surfactants in emulsion polymerization for coatings. However, such polymeric surfactants usually have low acid values below 200, because it is difficult to make high acid-value polymeric surfactants using a normal batch reactor. In this work, we polymerized high acid value polymeric surfactant having high acid values successfully up to 380 using CSTR (continuous stirring tank reactor). The synthesized polymeric surfactant was a random copolymer of P(BA-AA) and we applied them as anionic surfactants in making emulsion-type acrylic PSAs (Pressure-Sensitive Adhesives) to investigate the effects of high acid values on the adhesive properties. This CSTR can effectively control the composition and molecular weight of polymeric surfactants through varying monomer ratios, retention time, and initiator concentrations. The surface tension analysis and emulsion stability test indicated that the synthesized polymeric surfactants exhibited a similar levels of critical micelle concentration (CMC) and emulsion stability with other conventional anionic surfactants. Also, the adhesion property analysis showed that the PSA used high acid value polymeric surfactant resulting in superior adhesive properties and heat resistance than the PSAs used low acid value polymeric surfactant or conventional low molecular weight surfactant. It was very notable that polymeric surfactants having unusually high acid values above 300 because of their high contents of carboxylic acid groups could result in superior adhesive properties and heat resistance. © 2024 Elsevier B.V. | - |
| dc.format.extent | 10 | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | Elsevier BV | - |
| dc.title | Polymeric surfactants with high acid values for emulsion type pressure-sensitive adhesives | - |
| dc.type | Article | - |
| dc.publisher.location | 네델란드 | - |
| dc.identifier.doi | 10.1016/j.molliq.2024.124951 | - |
| dc.identifier.scopusid | 2-s2.0-85193426792 | - |
| dc.identifier.wosid | 001299054700001 | - |
| dc.identifier.bibliographicCitation | Journal of Molecular Liquids, v.405, pp 1 - 10 | - |
| dc.citation.title | Journal of Molecular Liquids | - |
| dc.citation.volume | 405 | - |
| dc.citation.startPage | 1 | - |
| dc.citation.endPage | 10 | - |
| dc.type.docType | Article | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Chemistry | - |
| dc.relation.journalResearchArea | Physics | - |
| dc.relation.journalWebOfScienceCategory | Chemistry, Physical | - |
| dc.relation.journalWebOfScienceCategory | Physics, Atomic, Molecular & Chemical | - |
| dc.subject.keywordPlus | NONIONIC SURFACTANTS | - |
| dc.subject.keywordPlus | BLOCK-COPOLYMERS | - |
| dc.subject.keywordPlus | BUTYL ACRYLATE | - |
| dc.subject.keywordPlus | PH-DEPENDENCE | - |
| dc.subject.keywordPlus | NONYLPHENOL | - |
| dc.subject.keywordPlus | BEHAVIOR | - |
| dc.subject.keywordPlus | ADSORPTION | - |
| dc.subject.keywordPlus | MICELLIZATION | - |
| dc.subject.keywordPlus | PERFORMANCE | - |
| dc.subject.keywordPlus | TOXICITY | - |
| dc.subject.keywordAuthor | Acrylics | - |
| dc.subject.keywordAuthor | CSTR polymerization | - |
| dc.subject.keywordAuthor | Emulsion | - |
| dc.subject.keywordAuthor | Polymeric surfactants | - |
| dc.subject.keywordAuthor | PSA | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
30, Pildong-ro 1-gil, Jung-gu, Seoul, 04620, Republic of Korea+82-2-2260-3114
Copyright(c) 2023 DONGGUK UNIVERSITY. ALL RIGHTS RESERVED.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.
