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Cited 29 time in webofscience Cited 32 time in scopus
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High electrochemical performance of nanoflakes like CuO electrode by successive ionic layer adsorption and reaction (SILAR) method

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dc.contributor.authorShinde, S. K.-
dc.contributor.authorGhodake, G. S.-
dc.contributor.authorFulari, V. J.-
dc.contributor.authorKim, D. -Y.-
dc.date.accessioned2024-08-08T04:31:20Z-
dc.date.available2024-08-08T04:31:20Z-
dc.date.issued2017-08-25-
dc.identifier.issn1226-086X-
dc.identifier.issn1876-794X-
dc.identifier.urihttps://scholarworks.dongguk.edu/handle/sw.dongguk/17963-
dc.description.abstractIn this paper, we report the effect of annealing on hybrid nanoflower like Cu(OH)(2)/CuO thin film prepared by simple and low-cost successive ionic layer adsorption and reaction (SILAR) method. As synthesized and annealed sample have been used for the structural characterization by using X-ray diffraction (XRD) analysis techniques. After finding pure phase of CuO sample, we have to use these electrodes for electrochemical supercapacitive properties, like cyclic voltammetry (CV), galvanostatic charge/discharge (GCD), and electrochemical impedance spectroscopy (EIS). Results exhibited that, CuO nanoflakes exhibit the higher value specific capacitance 476 F/g. Also, EIS studied to confirm lower ESR value, high power, performance, and excellent rate of CuO nanoflakes. Thus, present-day investigation effectively reports the applicability of facile and inexpensive SILAR method of synthesis of pure CuO nanostructure for the supercapacitor application. (C) 2017 The Korean Society of Industrial and Engineering Chemistry. Published by Elsevier B.V. All rights reserved.-
dc.format.extent6-
dc.language영어-
dc.language.isoENG-
dc.publisherELSEVIER SCIENCE INC-
dc.titleHigh electrochemical performance of nanoflakes like CuO electrode by successive ionic layer adsorption and reaction (SILAR) method-
dc.typeArticle-
dc.publisher.location미국-
dc.identifier.doi10.1016/j.jiec.2017.03.049-
dc.identifier.scopusid2-s2.0-85017439909-
dc.identifier.wosid000402349800003-
dc.identifier.bibliographicCitationJOURNAL OF INDUSTRIAL AND ENGINEERING CHEMISTRY, v.52, pp 12 - 17-
dc.citation.titleJOURNAL OF INDUSTRIAL AND ENGINEERING CHEMISTRY-
dc.citation.volume52-
dc.citation.startPage12-
dc.citation.endPage17-
dc.type.docTypeArticle-
dc.identifier.kciidART002249821-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.description.journalRegisteredClasskci-
dc.relation.journalResearchAreaChemistry-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalWebOfScienceCategoryChemistry, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryEngineering, Chemical-
dc.subject.keywordPlusOXIDE THIN-FILMS-
dc.subject.keywordPlusSUPERCAPACITOR APPLICATION-
dc.subject.keywordPlusHYDROTHERMAL SYNTHESIS-
dc.subject.keywordPlusONE-STEP-
dc.subject.keywordPlusNANOSTRUCTURES-
dc.subject.keywordPlusCARBON-
dc.subject.keywordPlusDEPOSITION-
dc.subject.keywordPlusNANOSHEETS-
dc.subject.keywordPlusDENSITY-
dc.subject.keywordPlusNETWORK-
dc.subject.keywordAuthorChemical synthesis-
dc.subject.keywordAuthorCuO thin films-
dc.subject.keywordAuthorNanostructures-
dc.subject.keywordAuthorElectrode materials-
dc.subject.keywordAuthorEnergy storage-
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