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Effects of Thermal Annealing on Dielectric Properties of High-k ZrO2 Layers Deposited on p-Ge Substrates
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 김득영 | - |
| dc.date.accessioned | 2023-05-11T11:41:38Z | - |
| dc.date.available | 2023-05-11T11:41:38Z | - |
| dc.date.issued | 2021-08-19 | - |
| dc.identifier.uri | https://scholarworks.dongguk.edu/handle/sw.dongguk/12083 | - |
| dc.title | Effects of Thermal Annealing on Dielectric Properties of High-k ZrO2 Layers Deposited on p-Ge Substrates | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 제61회 한국진공학회 하계정기학술대회 | - |
| dc.citation.conferencePlace | 대한민국 | - |
| dc.citation.conferenceDate | 2021-08-18 ~ 2021-08-20 | - |
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