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Thermal atomic layer deposition of aluminum oxide, nitride, and oxynitride: A mechanistic investigationopen access

Ahmed, Abu Talha Aqueel; Hafiyyan, Afina faza; Nurhidayati, Nurhidayati; Rayanisaputri, Fani Rahayu Hidayah; Alibrahim, Khuloud A.; Khadtare, Shubhangi S.; Rahman, Shofiur; Alodhayb, Abdullah N.; Rochman, Nurul Taufiqu; Ansari, Abu Saad

ArticleIssue Date2024CitationAIP Advances, v.14, no.3, pp 1 - 10PublisherAmerican Institute of Physics Inc.
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