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AFM-based nanoplowing lithography for fabricating plasmonic gaps enabling enhanced light-matter interactions

Jo, Jeong-Sik; Son, Hyeji; Lee, Jinho; Lee, Jihong; Kim, Teun-Teun; Jang, Jae-Won

ArticleIssue Date2025CitationApplied Surface Science, v.691, pp 1 - 9PublisherElsevier B.V.
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