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Role of immersion time on the properties of SILAR deposited CuO thin films

Ravichandran, A. T.; Dhanabalan, K.; Valanarasu, S.; Vasuhi, A.; Kathalingam, A.

ArticleIssue Date2015CitationJOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, v.26, no.2, pp 921 - 926PublisherSPRINGER
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